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Laser data |
Equipment | |||
| Laser type | ArF or KrCl Excimer Laser | Surgical microscope | Carl Zeiss OPMI-1FC | |
| Wavelength | 193 nm or 223 nm | Optical delivery system | "Medilex" | |
| Max. pulse energy | 250 mJ | Soft Ware | ||
| Repetition rate | 10 pps | Computer | ||
| Pulse duration | Approx. 15 ns | Monitor | Digital Color TFT,15" | |
| Ablation area | 0.5-7 mm | Microkeratom | for LASIK | |
| Fluence | 120-200 mJ/cm2 | Patient bed | Schwind | |
| Aiming Laser | Laser Diode 633 nm | Doctor's chair | Schwind | |
| Focusing Laser | DPSS-module 532 nm | |||
| Device data | |
| Laser dimensions | 1718 õ 1260 õ 1416 mm |
| Basic device weight | Approx. 400 kg, total |
| Cooling | Air |
| Power reguirments | 220 V, single-phase, 50 Hz |
| Power consumption | 500 W |
| Gas supply | 2 internal 10 l ArF premix gas cylinder |
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1. V.V.Lantuch, A.M. Razhev et al. UV excimer lasers in eye microsurgery // Lasers in the Life Sciences, 1988, v.2, ¹ 4, pp.271-284 2. "Un Dispositivo de Correccion de Anomalias de Refreccion del Ojo". Patente de Invencion, Espana, ¹ solicitud 8902371, ¹ publicacion 2014730. 16 July 1990. Priority: SU 11 July 1988, ¹ 4457772. 3."Device for correcting ocular refraction anomalies". United States Patent ¹ 4.953.969. Published: Sep.4 1990. Priority: Jul.11 1988 USSR ¹ 4457772. 4. S.N. Bagayev, A.M. Razhev, A.A. Zhupikov. Excimer Laser Ophthalmic Devices for Eye Microsurgery // Laser Physics, 1998, v.8, ¹3, p.794-798. 5. S.N. Bagayev, A.M. Razhev, A.A. Zhupikov. New 223 nm Excimer Surgical System for Photorefractive Keratectomy. // Proc.SPIE, 1998, v.3564, p.94-100. 6. S.N. Bagayev, A.M. Razhev, A.A. Zhupikov, E.S. Kargapoltsev. Advantages of using the 223-nm compared with 193-nm radiation wavelength for ophthalmic applications". Proc. SPIE, 2002, v.4900, p.1007-1013. |
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Postal address: |
Phone:
+7(383) 333-24-89 |